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Characterization of Ta thin films obtained by dc sputtering

✍ Scribed by A.P Mammana; I.L Torriani; M.A Silveira; L.A.C de Almeida

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
182 KB
Volume
41
Category
Article
ISSN
0042-207X

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Characterization of reactive DC magnetro
Characterization of reactive DC magnetron sputtered TiAlN thin films
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## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had