𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Characterization of NiO thin films deposited by reactive sputtering

✍ Scribed by I Hotový; D Búc; Š Haščík; O Nennewitz

Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
398 KB
Volume
50
Category
Article
ISSN
0042-207X

No coin nor oath required. For personal study only.

✦ Synopsis

Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical properties of the films were studied using thickness measurement, X-ray diffraction, transmission electron microscopy, Rutherford backscattering spectrometry and resistivity measurement.

A correlation between process parameters and film properties was established.

📜 SIMILAR VOLUMES

Aluminium nitride thin films deposited b
Aluminium nitride thin films deposited by DC reactive magnetron sputtering
✍ V. Dimitrova; D. Manova; T. Paskova; Tz. Uzunov; N. Ivanov; D. Dechev 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 375 KB

AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3×10 -3 ; high transmission occurred between [??] structure