Aluminium nitride thin films deposited by DC reactive magnetron sputtering

✍ Scribed by V. Dimitrova; D. Manova; T. Paskova; Tz. Uzunov; N. Ivanov; D. Dechev

• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 375 KB
• Volume: 51
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(98)00150-x

✦ Synopsis

AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3×10 -3 ; high transmission occurred between [??] structure and oxygen on microhardness is discussed.