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Deposition of molybdenum nitride thin films by r.f. reactive magnetron sputtering

✍ Scribed by V.P. Anitha; S. Major; D. Chandrashekharam; Mukesh Bhatnagar


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
597 KB
Volume
79
Category
Article
ISSN
0257-8972

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Thin films of CN x were deposited by reactive r.f.-magnetron sputtering on Si(100) substrates. The effect of annealing temperatures on the structural properties of the films has been studied by Fourier transform infrared (FTIR) spectroscopy, x-ray photoelectron spectroscopy (XPS) and transmission el