Characterization of NiO thin films depos
✍
I Hotový; D Búc; Š Haščík; O Nennewitz
📂
Article
📅
1998
🏛
Elsevier Science
🌐
English
⚖ 398 KB
Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper