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Optical and electrical characteristics of amorphous boron carbonitride thin films deposited by radiofrequency sputtering

✍ Scribed by A. Essafti; E. Ech-chamikh

Publisher
Springer
Year
2011
Tongue
English
Weight
283 KB
Volume
46
Category
Article
ISSN
0022-2461

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## Abstract Boron‐doped nanocrystalline silicon (nc‐Si:H) films were deposited by plasma‐enhanced chemical vapor deposition (PECVD). A variety of techniques, including X‐ray diffraction (XRD), Raman scattering (RS), UV–Vis–NIR spectroscopy and conductivity measurement were used to characterize the