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Nanocrystalline titanium carbide thin films deposited by reactive magnetron sputtering

✍ Scribed by J. Musil; D. Hovorka; M. Mišina; A. J. Bell; V. Studnička

Book ID
110426936
Publisher
Springer
Year
1998
Tongue
English
Weight
393 KB
Volume
48
Category
Article
ISSN
0011-4626

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Aluminium nitride thin films deposited by DC reactive magnetron sputtering
✍ V. Dimitrova; D. Manova; T. Paskova; Tz. Uzunov; N. Ivanov; D. Dechev 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 375 KB

AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3×10 -3 ; high transmission occurred between [??] structure