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Conventional and ionized magnetron sputter‐deposition of nanocrystalline titanium diboride thin films

✍ Scribed by Mei‐Ling Wu; Xi‐Wei Lin; Vinayak P. Dravid; Yip‐Wah Chung; Ming‐Show Wong; William D. Sproul


Book ID
110385813
Publisher
Springer US
Year
1998
Tongue
English
Weight
574 KB
Volume
5
Category
Article
ISSN
1023-8883

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Thin films of carbon mixed LiFePO 4 were prepared by ionized magnetron sputter deposition (IMSD) and post anneal. The IMSD technique uses a built-in radio frequency coil to generate an inductively coupled plasma (ICP) confined close to the substrate. Therefore, the films were deposited under concurr