AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3Γ10 -3 ; high transmission occurred between [??] structure
β¦ LIBER β¦
Structure and Composition of TiVN Thin Films Deposited by Reactive DC Magnetron Co-sputtering
β Scribed by T. Deeleard; A. Buranawong; A. Choeysuppaket; N. Witit-anun; S. Chaiyakun; P. Limsuwan
- Book ID
- 119357506
- Publisher
- Elsevier
- Year
- 2012
- Tongue
- English
- Weight
- 446 KB
- Volume
- 32
- Category
- Article
- ISSN
- 1877-7058
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