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Characterization of Nanostructured TiZrN Thin Films Deposited by Reactive DC Magnetron Co-sputtering

✍ Scribed by S. Chinsakolthanakorn; A. Buranawong; N. Witit-anun; S. Chaiyakun; P. Limsuwan

Book ID
119356619
Publisher
Elsevier
Year
2012
Tongue
English
Weight
478 KB
Volume
32
Category
Article
ISSN
1877-7058

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Aluminium nitride thin films deposited b
Aluminium nitride thin films deposited by DC reactive magnetron sputtering
✍ V. Dimitrova; D. Manova; T. Paskova; Tz. Uzunov; N. Ivanov; D. Dechev πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 375 KB

AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3Γ—10 -3 ; high transmission occurred between [??] structure