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Deposition of A1N thin films by magnetron reactive sputtering

✍ Scribed by E.V. Gerova; N.A. Ivanov; K.I. Kirov

Book ID
107863992
Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
327 KB
Volume
81
Category
Article
ISSN
0040-6090

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Aluminium nitride thin films deposited by DC reactive magnetron sputtering
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AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3Γ—10 -3 ; high transmission occurred between [??] structure