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Study of reactive DC magnetron sputtering deposition of AlN thin films

✍ Scribed by VI Dimitrova; DI Manova; DA Dechev

Book ID
108390377
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
443 KB
Volume
49
Category
Article
ISSN
0042-207X

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πŸ“œ SIMILAR VOLUMES

Aluminium nitride thin films deposited b
Aluminium nitride thin films deposited by DC reactive magnetron sputtering
✍ V. Dimitrova; D. Manova; T. Paskova; Tz. Uzunov; N. Ivanov; D. Dechev πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 375 KB

AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3Γ—10 -3 ; high transmission occurred between [??] structure

Characterization of reactive DC magnetro
Characterization of reactive DC magnetron sputtered TiAlN thin films
✍ B. Subramanian; K. Ashok; P. Kuppusami; C. Sanjeeviraja; M. Jayachandran πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 180 KB

## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had