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Thickness of the SiO2Si interface and composition of silicon oxide thin films: effect of wafer cleaning procedures

โœ Scribed by F.C. Stedile; I.J.R. Baumvol; I.F. Oppenheim; I. Trimaille; J.-J. Ganem; S. Rigo


Book ID
113287221
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
619 KB
Volume
118
Category
Article
ISSN
0168-583X

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