✦ LIBER ✦

Microprobe technique for determining the thickness of SiO2 and Si3N4 ultra-thin film composites of fet wafers and devices

✍ Scribed by Giulio Digiacomo

Book ID: 107862242
Publisher: Elsevier Science
Year: 1976
Tongue: English
Weight: 596 KB
Volume: 38
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(76)90276-5

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Secondary electron yield of SiO2 and Si3

Secondary electron yield of SiO2 and Si3N4 thin films for continuous dynode electron multipliers

✍ J.J. Fijol; A.M. Then; G.W. Tasker; R.J. Soave 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 420 KB

(Me5C5)SiH3 and (Me5C5)2SiH2 as precurso

(Me5C5)SiH3 and (Me5C5)2SiH2 as precursors for low-temperature remote plasma-enhanced CVD of thin Si3N4 and SiO2 films

✍ Jürgen Dahlhaus; Prof. Peter Jutzi; Dr. Hubert-Joachim Frenck; Dr. Wilhelm Kulis 📂 Article 📅 1993 🏛 John Wiley and Sons 🌐 English ⚖ 469 KB 👁 1 views