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Influence of the silicon wafer cleaning treatment on the Si/SiO2 interfaces analyzed by infrared spectroscopy

✍ Scribed by B. Garrido; J. Samitier; J.R. Morante; L. Fonseca; F. Campabadal

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 296 KB
Volume: 56-58
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(92)90351-w

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