Thermal stability and structural characteristics of HfO[sub 2] films on Si (100) grown by atomic-layer deposition

✍ Scribed by Cho, M.-H.; Roh, Y. S.; Whang, C. N.; Jeong, K.; Nahm, S. W.; Ko, D.-H.; Lee, J. H.; Lee, N. I.; Fujihara, K.

• Book ID: 121384917
• Publisher: American Institute of Physics
• Year: 2002
• Tongue: English
• Weight: 336 KB
• Volume: 81
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.1487923