𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effects of crystallization on the electrical properties of ultrathin HfO[sub 2] dielectrics grown by atomic layer deposition

✍ Scribed by Kim, Hyoungsub; McIntyre, Paul C.; Saraswat, Krishna C.


Book ID
121710335
Publisher
American Institute of Physics
Year
2003
Tongue
English
Weight
349 KB
Volume
82
Category
Article
ISSN
0003-6951

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Ultrathin HfO2 films grown on silicon by
✍ E.P. Gusev; C. Cabral Jr.; M. Copel; C. D’Emic; M. Gribelyuk πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 584 KB

We report on growth behavior, structure, thermal stability and electrical properties of ultrathin (,10 nm) hafnium oxide films deposited by atomic layer deposition using sequential exposures of HfCl and H O at 300 8C on a bare silicon surface 4 2 or a thin thermally grown SiO -based interlayer. Comp