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Characterization of the Ultrathin HfO2 and Hf-Silicate Films Grown by Atomic Layer Deposition

✍ Scribed by Tze Chiang Chen; Cheng-Yi Peng; Chih-Hung Tseng; Ming-Han Liao; Mei-Hsin Chen; Chih-I Wu; Ming-Yau Chern; Pei-Jer Tzeng; Chee Wee Liu

Book ID: 114618655
Publisher: IEEE
Year: 2007
Tongue: English
Weight: 592 KB
Volume: 54
Category: Article
ISSN: 0018-9383
DOI: 10.1109/ted.2007.892012

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