Enhancement in thermal stability of atomic layer deposited HfO2 films by using top Hf metal layer

✍ Scribed by Tae Joo Park; Jeong Hwan Kim; Jae Hyuck Jang; Minha Seo; Kwang Duk Na; Cheol Seong Hwang

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 782 KB
• Volume: 84
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2007.04.082