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Thermal-annealing effects on the structural and electrical properties of heavy-ion-implanted silicon layers

✍ Scribed by Jumana Said; Gérard Ghibaudo; Iannis Stoemenos; Peter Zaumseil


Book ID
113282443
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
398 KB
Volume
55
Category
Article
ISSN
0168-583X

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