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The structural and interfacial properties of HfO2/Si by the plasma oxidation of sputtered metallic Hf thin films

โœ Scribed by G He; Q Fang; M Liu; L.Q Zhu; L.D Zhang


Book ID
108165845
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
394 KB
Volume
268
Category
Article
ISSN
0022-0248

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