Structural properties of Al2O3/AlN thin film prepared by magnetron sputtering of Al in HF-activated nitrogen plasma

✍ Scribed by Dallaeva, D.S.; Bilalov, B.A.; Gitikchiev, M.A.; Kardashova, G.D.; Safaraliev, G.K.; Tománek, P.; Škarvada, P.; Smith, S.

• Book ID: 120215905
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 815 KB
• Volume: 526
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2012.11.023