Dielectric properties of DC reactive magnetron sputtered Al2O3 thin films
β Scribed by Prasanna S.; Mohan Rao G.; Jayakumar S.; Kannan M.D.; Ganesan V.
- Book ID
- 113937475
- Publisher
- Elsevier Science
- Year
- 2012
- Tongue
- English
- Weight
- 902 KB
- Volume
- 520
- Category
- Article
- ISSN
- 0040-6090
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## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. Xβray diffraction (XRD) analysis showed that the TiAlN phase had
Al 2 O 3 films were deposited by reactive ionized magnetron sputtering and their hardness was measured by nanoindentation. The magnetron was powered with a pulsed DC power supply, and the substrate was negatively biased with a pulsed DC voltage supply. An RF powered coil was located above the substr