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The relaxation phenomena of positive charges in thin gate oxide during Fowler-Nordheim tunneling stress

✍ Scribed by Kow-Ming Chang; Chii-Horng Li; Shih-Wei Wang; Ta-Hsun Yeh; Ji-Yi Yang; Tzyh-Cheang Lee


Book ID
114537382
Publisher
IEEE
Year
1998
Tongue
English
Weight
160 KB
Volume
45
Category
Article
ISSN
0018-9383

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