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Relaxation of interface states and positive charge in thin gate oxide after FowlerâNordheim stress

✍ Scribed by El Hdiy, A.; Salace, G.; Petit, C.; Jourdain, M.; Meinertzhagen, A.

No coin nor oath required. For personal study only.

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Relaxation of interface states and positive charge in thin gate oxide after FowlerâNordheim stress