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The mechanism of simultaneous implantation and sputtering by high energy oxygen ions during secondary ion mass spectrometry (SIMS) analysis

โœ Scribed by J.C.C. Tsai; J.M. Morabito


Book ID
118980866
Publisher
Elsevier Science
Year
1974
Tongue
English
Weight
335 KB
Volume
44
Category
Article
ISSN
0039-6028

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