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The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering

✍ Scribed by J.T. Lue; O. Meyer; J. Lombaard; R.H. Wang

Publisher: Elsevier Science
Year: 1982
Tongue: English
Weight: 409 KB
Volume: 25
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(82)90025-9

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