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The influence of deposition parameters on the properties of amorphous silicon thin films produced by the magnetron sputtering method

โœ Scribed by A.K. Batabyal; P. Chaudhuri; Swati Ray; A.K. Barua


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
415 KB
Volume
112
Category
Article
ISSN
0040-6090

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