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Effect of deposition parameters on the properties of amorphous silicon-germanium alloy films grown by the photo-CVD method

✍ Scribed by Abhijit De; Swati Ray; A.K. Barua

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 576 KB
Volume: 229
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(93)90367-x

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