Influence of the Basic Process Parameters on the Ion/Atom Arrival Rate Ratio during Magnetron Sputter Deposition of Thin Carbon Films

✍ Scribed by I. Petrov; V. Orlinov; I. Ivanov; J. Kourtev

• Publisher: John Wiley and Sons
• Year: 1988
• Tongue: English
• Weight: 559 KB
• Volume: 28
• Category: Article
• ISSN: 0005-8025
• DOI: 10.1002/ctpp.2150280309