✦ LIBER ✦
Influence of the Plasma Kinetics on the Si/C Ratio of a-SixC1-x: H Thin Films Deposited by Reactive Magnetron Sputtering of a Si Target in Ar + CH4 Gas Mixtures
✍ Scribed by Sv. Statev; I. Ivanov; I. Petrov; J. Carlsson; V. Orlinov
- Publisher
- John Wiley and Sons
- Year
- 1994
- Tongue
- English
- Weight
- 730 KB
- Volume
- 34
- Category
- Article
- ISSN
- 0005-8025
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