The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering : J. T. Lue, O. Meyer and J. Lombaard. Solid-St. Electron.25 (10), 1011 (1982)

• Publisher: Elsevier Science
• Year: 1983
• Tongue: English
• Weight: 115 KB
• Volume: 23
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(83)91330-6