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The influence of H2/Ar ratio on Ge content of the μc-SiGe:H films deposited by PECVD

✍ Scribed by Zeguo Tang; Wenbin Wang; Desheng Wang; Dequan Liu; Qiming Liu; Deyan He

Book ID: 116606941
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 305 KB
Volume: 504
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2010.05.128

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