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Influence of Ar/H2 ratio on the characteristics of boron-doped nc-Si:H films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition

โœ Scribed by Zhang, Xueyu; Wu, Aimin; Shi, Shaofei; Qin, Fuwen


Book ID
122706705
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
522 KB
Volume
228
Category
Article
ISSN
0257-8972

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