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Influence of Ar/H2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition

✍ Scribed by Xueyu Zhang; Aimin Wu; Shaofei Shi; Fuwen Qin; Jiming Bian

Book ID: 118501862
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 444 KB
Volume: 521
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.12.038

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