The influence of H2/(H2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD

✍ Scribed by Zeguo Tang; Wenbin Wang; Bo Zhou; Desheng Wang; Shanglong Peng; Deyan He

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 690 KB
• Volume: 255
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2009.06.074