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The influence of H2/(H2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD

โœ Scribed by Zeguo Tang; Wenbin Wang; Bo Zhou; Desheng Wang; Shanglong Peng; Deyan He


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
690 KB
Volume
255
Category
Article
ISSN
0169-4332

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