Si 1-x Ge x films with nanodot arrays are prepared on anodic aluminum oxide (AAO) templates by plasma-enhanced (PE)CVD. The structure and morphology of the films are investigated using X-ray diffraction (XRD) spectroscopy and transmission electron microscopy (TEM). It is found that the size of the S
The Influence of In/Cu Ratio on Electrical Properties of CuO:In Thin Films Prepared by Plasma-Enhanced CVD
β Scribed by Y. Hao; H. Gong
- Publisher
- John Wiley and Sons
- Year
- 2008
- Tongue
- English
- Weight
- 271 KB
- Volume
- 14
- Category
- Article
- ISSN
- 0948-1907
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