Influence of the Oxygen Partial Pressure
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Jiang, J.C. ;Li, B. ;Zhang, Z.Q. ;Hu, P.G. ;Zhang, F.S. ;Cheng, H.S. ;Yang, F.J.
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Article
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2002
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John Wiley and Sons
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English
⚖ 117 KB
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Quantitative depth profiling and compositional analysis of oxygen in TiO x film deposited on K9 glass was carried out using the resonant elastic scattering 16 O(a, a) 16 O at 3.045 MeV. By means of the resonance yield, the oxygen concentration in TiO x films as well as the oxygen-to-metal stoichiome