Influence of the Oxygen Partial Pressure on the Composition and Optical Properties of Electron-beam Evaporated TiOx Films

✍ Scribed by Jiang, J.C. ;Li, B. ;Zhang, Z.Q. ;Hu, P.G. ;Zhang, F.S. ;Cheng, H.S. ;Yang, F.J.

• Publisher: John Wiley and Sons
• Year: 2002
• Tongue: English
• Weight: 117 KB
• Volume: 193
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/1521-396x(200209)193:1<69::aid-pssa69>3.0.co;2-4

✦ Synopsis

Quantitative depth profiling and compositional analysis of oxygen in TiO x film deposited on K9 glass was carried out using the resonant elastic scattering 16 O(a, a) 16 O at 3.045 MeV. By means of the resonance yield, the oxygen concentration in TiO x films as well as the oxygen-to-metal stoichiometry as a function of the depth probed can be deduced. TiO x films deposited by electronbeam evaporation at different oxygen partial pressures were analyzed, and it is shown that the oxygen concentration in the films is homogeneous. Oxygen partial pressure in the process of evaporation drastically affects the oxygen concentration in the films, and the refractive indices and the extinction coefficients of the films decrease with the increasing oxygen concentration in the films. Under our deposition conditions, we found that 1.6 Â 10 --4 Torr is the optimum value of oxygen partial pressure for forming TiO 2 films by the electron-beam evaporation method. At this oxygen partial pressure, we can prepare an excellent band-pass filter.