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The impact of high-κ gate dielectrics and metal gate electrodes on sub-100 nm MOSFETs

✍ Scribed by Cheng, B.; Cao, M.; Rao, R.; Inani, A.; Vande Voorde, P.; Greene, W.M.; Stork, J.M.C.; Zhiping Yu; Zeitzoff, P.M.; Woo, J.C.S.

No coin nor oath required. For personal study only.

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