Impact of Crystalline Phase of Ni-FUSI Gate Electrode on Bias Temperature Instability and Gate Dielectric Breakdown of HfSiON MOSFETs

✍ Scribed by Masayuki Terai; Takashi Onizawa; Setsu Kotsuji; Nobuyuki Ikarashi; Akio Toda; Shinji Fujieda; Hirohito Watanabe

• Book ID: 114618608
• Publisher: IEEE
• Year: 2007
• Tongue: English
• Weight: 534 KB
• Volume: 54
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2006.890266