High-κ Metal Gate MOSFETs: Impact of Extrinsic Process Condition on the Gate-Stack Quality—A Mobility Study

✍ Scribed by Trojman, L.; Ragnarsson, L.-A.; O'Sullivan, B.J.; Rosmeulen, M.; Kaushik, V.S.; Groeseneken, G.V.; Maes, H.E.; De Gendt, S.; Heyns, M.

• Book ID: 114618603
• Publisher: IEEE
• Year: 2007
• Tongue: English
• Weight: 296 KB
• Volume: 54
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2006.890230