✦ LIBER ✦
Optimization of the source/drain extension region profile for suppression of short channel effects in sub-50 nm DG MOSFETs with high-κ gate dielectrics
✍ Scribed by Kranti, Abhinav; Armstrong, G Alastair
- Book ID
- 124053505
- Publisher
- Institute of Physics
- Year
- 2006
- Tongue
- English
- Weight
- 310 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0268-1242
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