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The evolution of the Si/SiO2 interface in buried oxide layers formed by high dose oxygen implantation into silicon

โœ Scribed by R.J. Chater; J.A. Kilner; P.L.F. Hemment; K.J. Reeson; J.R. Davis


Book ID
114168082
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
308 KB
Volume
19-20
Category
Article
ISSN
0168-583X

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