๐”– Bobbio Scriptorium
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Formation of buried oxide layers by high dose implantation of oxygen ions in silicon

โœ Scribed by K. Das; J. B. Butcher; K. V. Anand


Book ID
112814175
Publisher
Springer US
Year
1984
Tongue
English
Weight
646 KB
Volume
13
Category
Article
ISSN
0361-5235

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