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Oxygen distributions in synthesized SiO2 layers formed by high dose O+ implantation into silicon

โœ Scribed by PLF Hemment; E Maydell-Ondrusz; KG Stevens; JA Kilner; J Butcher


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
579 KB
Volume
34
Category
Article
ISSN
0042-207X

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