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The Effect of Gate Oxide Processes on the Performance of 4H-SiC MOSFETs and Gate-Controlled Diodes

โœ Scribed by Wang, Y.; Tang, K.; Khan, T.; Koushik Balasubramanian, M.; Naik, H.; Wei Wang; Chow, T.P.


Book ID
114619490
Publisher
IEEE
Year
2008
Tongue
English
Weight
840 KB
Volume
55
Category
Article
ISSN
0018-9383

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