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Effects of rapid thermal annealing on nitrided gate oxide grown on 4H-SiC

✍ Scribed by K.Y. Cheong; W. Bahng; N.-K. Kim


Book ID
108207529
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
532 KB
Volume
83
Category
Article
ISSN
0167-9317

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