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The Atomic Layer Deposition of HfO2 and ZrO2 using Advanced Metallocene Precursors and H2O as the Oxygen Source

✍ Scribed by Charles L. Dezelah IV; Jaakko Niinistö; Kaupo Kukli; Frans Munnik; Jun Lu; Mikko Ritala; Markku Leskelä; Lauri Niinistö

Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
385 KB
Volume
14
Category
Article
ISSN
0948-1907

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