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The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS

✍ Scribed by B.E. Volland; H. Heerlein; I. Kostic; I.W. Rangelow


Book ID
114155300
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
703 KB
Volume
57-58
Category
Article
ISSN
0167-9317

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